Let’s be honest — not too many of us have a need to deposit nanometer-thick films onto substrates in a controlled manner. But if you do find yourself in such a situation, you could do worse than following [Jeroen Vleggaar]’s lead as he builds out a physical vapor deposition apparatus to do just that.
Thankfully, [Jeroen] has particular expertise in this area, and is willing to share it. PVD is used to apply an exceedingly thin layer of metal or organic material to a substrate — think lens coatings or mirror silvering, as well as semiconductor manufacturing. The method involves heating the coating material in a vacuum such that it vaporizes and accumulates on a substrate in a controlled fashion. Sounds simple, but the equipment and know-how needed to actually accomplish it are daunting. [Jeroen]’s shopping list included high-current power supplies to heat the coating material, turbomolecular pumps to evacuate the coating chamber, and instruments to monitor the conditions inside the chamber. Most of the chamber itself was homemade, a gutsy move for a novice TIG welder. Highlights from the build are in the video below, which also shows the PVD setup coating a glass disc with a thin layer of silver.
This build is chock full of nice details; we especially liked the technique of monitoring deposition progress by measuring the frequency change of an oscillator connected to a crystal inside the chamber as it accumulates costing material. We’re not sure where [Jeroen] is going with this, but we suspect it has something to do with some hints he dropped while talking about his experiments with optical logic gates. We’re looking forward to seeing if that’s true.