Looks like [Sam Zeloof] got bored on his Thanksgiving break, and things got a little weird in his garage. Of course when your garage contains a scanning electron microscope, the definition of weird can include experimenting with electron-beam lithography, resulting in tiny images etched into silicon.
You’ll probably remember [Sam] from his 2018 Hackaday Superconference talk on his DIY semiconductor fab lab, which he used to create a real integrated circuit. That chip, a PMOS dual-channel differential amp, was produced by photolithography using a modified DLP projector. Photolithography imposes limits to how small a feature can be created on silicon, based on the wavelength of light.
[Sam] is now looking into using the electron beam of his SEM as a sort of CNC laser engraver to produce much finer features. The process involves spin-coating silicon wafers with SU-8, an epoxy photoresist normally used with UV light but that also turns out to be sensitive to electron beams. He had to modify his SEM to control the X- and Y-axis deflection with a 12-bit DAC and provide a custom beam blanker. With a coated wafer in the vacuum chamber, standard laser engraving software generates the G-code to trace his test images on the resist. A very quick dip in acetone develops the exposed chip.
[Sam] says these first test images are not too dainty; the bears are about 2.5 mm high, and the line width is about 10 μm. His system is currently capable of resolving down to 100 nm, while commercial electron beam lithography can get down to 5 nm or so. He says that adding a Faraday cage to the setup might help him get there. Sounds like a project for Christmas break.